Xilinx and technology and manufacturing partner Taiwan Semiconductor Manufacturing Company (TSMC) developed a high-κ metal gate (HKMG), high-performance, low-power 28nm process technology for FPGAs. This new 28nm process technology builds upon the achievements of 40nm FPGA process development and introduces a new HKMG technology to maximize usable system performance through lower power.
Our technology, although unique in the FPGA industry, is already being embraced by other leading-edge IC suppliers because it dramatically reduces static power when compared with alternative process technologies. At the 28nm node, static power is often a more significant portion of the total power dissipation of a device. Therefore, to achieve maximum power efficiency, the choice of process technology is paramount.
Dramatic reductions in FPGA static power at 28nm leaves more of the system power budget for active, dynamic power, yielding higher levels of both integration and system performance. This gives designers the flexibility to implement products at lower power, or alternatively, create products that increase capacity and performance within the same power budget.